https://data.archives-ouvertes.fr/author/178219

https://data.archives-ouvertes.fr/author/178219

http://xmlns.com/foaf/0.1/topic_interest Plasma confinement
http://xmlns.com/foaf/0.1/topic_interest Discharges electric
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/spi.elec
http://xmlns.com/foaf/0.1/topic_interest Plasma sheaths
http://xmlns.com/foaf/0.1/topic_interest Pulsed gas injection
http://xmlns.com/foaf/0.1/topic_interest Time reversal
http://xmlns.com/foaf/0.1/topic_interest Aerosols
http://xmlns.com/foaf/0.1/topic_interest Magnetic confinement
http://xmlns.com/foaf/0.1/topic_interest Interfaces
http://xmlns.com/foaf/0.1/topic_interest Microwave plasma sources
http://xmlns.com/foaf/0.1/topic_interest Plasma-wall interactions
http://xmlns.com/foaf/0.1/topic_interest Aerosol-assisted atmospheric pressure plasma
http://xmlns.com/foaf/0.1/topic_interest Spectroscopie
http://xmlns.com/foaf/0.1/topic_interest Carbon
http://xmlns.com/foaf/0.1/topic_interest Applications industrielles
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/spi.mat
http://xmlns.com/foaf/0.1/topic_interest Safer-by-design
http://xmlns.com/foaf/0.1/topic_interest Chemical processes
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/spi.nrj
http://xmlns.com/foaf/0.1/topic_interest Technique des plasmas
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/spi.plasma
http://xmlns.com/foaf/0.1/topic_interest Laser photodetachment
http://xmlns.com/foaf/0.1/topic_interest Transfert d'énergie
http://xmlns.com/foaf/0.1/topic_interest Couches minces
http://xmlns.com/foaf/0.1/topic_interest Atmospheric Pressure Plasma Processes
http://xmlns.com/foaf/0.1/topic_interest Plasmas froids
http://xmlns.com/foaf/0.1/topic_interest Cyclotron resonance
http://xmlns.com/foaf/0.1/name Richard Clergereaux
http://xmlns.com/foaf/0.1/topic_interest Electrical properties characterization
http://xmlns.com/foaf/0.1/topic_interest Amorphous hydrogenated carbon
http://xmlns.com/foaf/0.1/topic_interest Nanocomposite thin films
http://xmlns.com/foaf/0.1/topic_interest Thin films
http://xmlns.com/foaf/0.1/topic_interest Frequency spectrum
http://xmlns.com/foaf/0.1/topic_interest Plasma waves
http://xmlns.com/foaf/0.1/topic_interest Optical emission spectroscopy
http://xmlns.com/foaf/0.1/topic_interest Nanoparticles
http://xmlns.com/foaf/0.1/topic_interest Atmospheric pressure
http://xmlns.com/foaf/0.1/topic_interest Modélisation
http://xmlns.com/foaf/0.1/topic_interest Oxidation
http://xmlns.com/foaf/0.1/topic_interest Plasma instabilities
http://xmlns.com/foaf/0.1/topic_interest Dielectric barrier discharges
http://xmlns.com/foaf/0.1/topic_interest Plasma processing
http://xmlns.com/foaf/0.1/topic_interest Laser
http://xmlns.com/foaf/0.1/topic_interest Non-equilibrium plasma
http://xmlns.com/foaf/0.1/topic_interest Transient field shaping
http://xmlns.com/foaf/0.1/topic_interest Townsend discharges
http://xmlns.com/foaf/0.1/topic_interest Dusty plasma
http://xmlns.com/foaf/0.1/topic_interest Magnetron discharges
http://xmlns.com/foaf/0.1/topic_interest CoatingsMetal oxideNanoparticlesOrganometallic chemistrySafe-by-design aerosol
http://xmlns.com/foaf/0.1/topic_interest Magnetized plasmas
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/phys.cond.cm-ms
http://xmlns.com/foaf/0.1/topic_interest Spectrométrie
http://xmlns.com/foaf/0.1/familyName Clergereaux
http://xmlns.com/foaf/0.1/topic_interest Plasma deposition
http://xmlns.com/foaf/0.1/topic_interest Hexamethyldisilane
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/phys.phys.phys-plasm-ph
http://xmlns.com/foaf/0.1/firstName Richard
http://xmlns.com/foaf/0.1/topic_interest Thin film coating
http://xmlns.com/foaf/0.1/topic_interest Spectroscopic ellipsometry
http://xmlns.com/foaf/0.1/topic_interest Low-pressure discharges
http://xmlns.com/foaf/0.1/topic_interest Atmospheric pressure plasma deposition
http://xmlns.com/foaf/0.1/topic_interest Biomasse
http://xmlns.com/foaf/0.1/topic_interest Pulsed direct liquid reactor injector
http://xmlns.com/foaf/0.1/topic_interest Negative ions
http://xmlns.com/foaf/0.1/topic_interest Aerosol-Assisted Plasma Deposition
http://xmlns.com/foaf/0.1/topic_interest Hors-équilibre
http://xmlns.com/foaf/0.1/topic_interest Reverberation chamber
http://xmlns.com/foaf/0.1/topic_interest Aerosol
http://xmlns.com/foaf/0.1/topic_interest Electrical conductivity
http://xmlns.com/foaf/0.1/topic_interest Inverse source problem
http://xmlns.com/foaf/0.1/topic_interest Silicon oxide
http://xmlns.com/foaf/0.1/topic_interest Plasma CVD
http://www.openarchives.org/ore/terms/isAggregatedBy https://data.archives-ouvertes.fr/author/richard-clergereaux
http://xmlns.com/foaf/0.1/topic_interest Plasma density
http://xmlns.com/foaf/0.1/topic_interest Chemical elements
http://xmlns.com/foaf/0.1/topic_interest Dynamique moléculaire
http://xmlns.com/foaf/0.1/topic_interest Pulsed Direct Liquid Injection
http://www.w3.org/2002/07/owl#sameAs 061141321
http://xmlns.com/foaf/0.1/mbox_sha1sum 707912ea7b2ce98c74763369e35ba1a9
http://xmlns.com/foaf/0.1/topic_interest Acetylene
http://www.w3.org/1999/02/22-rdf-syntax-ns#type http://xmlns.com/foaf/0.1/Person
http://xmlns.com/foaf/0.1/topic_interest Hardness
http://xmlns.com/foaf/0.1/topic_interest Organosilicon Coatings
http://xmlns.com/foaf/0.1/topic_interest Carbon nanoparticles
http://xmlns.com/foaf/0.1/interest https://data.archives-ouvertes.fr/subject/chim
http://xmlns.com/foaf/0.1/topic_interest Collisional radiative modeling
http://xmlns.com/foaf/0.1/topic_interest Optique
http://www.w3.org/2002/07/owl#sameAs 0000-0001-8014-6154
http://xmlns.com/foaf/0.1/topic_interest Phase transitions
http://xmlns.com/foaf/0.1/topic_interest RF plasma
http://xmlns.com/foaf/0.1/topic_interest Plasma sources
http://xmlns.com/foaf/0.1/topic_interest Current–voltage characteristics
http://xmlns.com/foaf/0.1/topic_interest Dielectric barrier discharge
http://xmlns.com/foaf/0.1/topic_interest FTIR
http://xmlns.com/foaf/0.1/topic_interest Aerosol-assisted process
https://aurehal.archives-ouvertes.fr/author/178219

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